Implantation image

IBS is the perfect partner for supporting your Ion Implantation needs, whither its production or R&D IBS has a solution to fit all customer’s needs.

From our two production facilities in France and UK. IBS operates a world class Ion Implantation service. Based on 30 years’ experience of Ion Implantation we offer the complete service to our customers. With a well-established Quality control system and extensive technical expertise devoted solely to Ion Implantation processing

IBS can process production volumes from 2” (50 mm) through 8” (200 mm) diameter substrates as well as custom shapes, thicknesses and materials. Along with standard medium and high current dopant species, IBS

Benefits of Out Sourcing:

  • Increase your capacity without heavy investments
  • Efficient production back-up enables you to meet your delviery times
  • Cost effective even for small volume
  • Assistance in defining processes and/or chossing equipment
  • R&D outsourcing. Today's labs are busy places with tool time at a premium. Developing precess can be challenging on production tools. IBS is able to offer and outsourced R&D services to assist in developing new process


Standard Implant:

Species Ar, As, B, BF2, Ge, P, Sb, Si...
Energy 5 to 200keV for Single Charge, 200 to 600 keV for double and triple charge
Dose 1E10 to 1E17/cm
Wafer sizes Sample and 2" to 8" substrates

Compound Semiconductors:

Species                  Be, C, Co, Fe, H, He, Mg, S, Si, Si...  
Energy Low Energy 2 to 15KeV
  High Energy up to 5MeV
150mm and 200mm  TAIKO© wafers implant service



NV6200A 2 systems
IMC200 1 system
NV6200AV 1 system
NV10-160 2 systems
8250P 2 systems
E500 2 systems
9500 2 systems